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Research Papers : Notching Phenomena of Silicon Gate Electrode in Plasma Etching Process
Applied Chemistry for Engineering :: Vol.20 No.1 pp.99-103
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Applied Chemistry for Engineering :: Vol.19 No.6 pp.640-644
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Applied Chemistry for Engineering :: Vol.19 No.3 pp.270-276
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Research Papers : Deposition of Amorphous Carbon Layer by PECVD
Applied Chemistry for Engineering :: Vol.19 No.3 pp.322-325
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Research Papers : Decomposition of Chlorinated Methane by Thermal Plasma
Applied Chemistry for Engineering :: Vol.18 No.2 pp.136-141
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Research Papers : Etch Characteristics of Zinc Oxide Thin Films in a Cl2/Ar Plasma
Applied Chemistry for Engineering :: Vol.18 No.1 pp.24-28
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Applied Chemistry for Engineering :: Vol.18 No.1 pp.84-89
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Applied Chemistry for Engineering :: Vol.17 No.4 pp.409-413
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Applied Chemistry for Engineering :: Vol.17 No.4 pp.414-419
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Applied Chemistry for Engineering :: Vol.17 No.2 pp.194-200
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Invited Review Article : Non-thermal Plasma for Air Pollution Control Technology
Applied Chemistry for Engineering :: Vol.17 No.1 pp.1-11
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Invited Review Article : Thermal Plasma Process for Producing Ultra-fine Powders
Applied Chemistry for Engineering :: Vol.16 No.3 pp.305-311
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Applied Chemistry for Engineering :: Vol.16 No.3 pp.361-365
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Applied Chemistry for Engineering :: Vol.16 No.3 pp.413-421
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Applied Chemistry for Engineering :: Vol.15 No.6 pp.611-617
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Research Papers : Synthesis of Titanium Carbide Nanopowder using Thermal Plasma
Applied Chemistry for Engineering :: Vol.14 No.8 pp.1028-1032
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Applied Chemistry for Engineering :: Vol.14 No.8 pp.1081-1085
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Research Papers : The Sublimation Synthesis of Titania Powder with Nano-crystalline Structure
Applied Chemistry for Engineering :: Vol.14 No.4 pp.470-474
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Applied Chemistry for Engineering :: Vol.12 No.7 pp.820-826
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Applied Chemistry for Engineering :: Vol.12 No.2 pp.154-159
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