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In-situ Deposition Rate Measurement System to Improve the Accuracy of the Film Formation Process

Somi Park, Seung-Yo Baek, Hyun-Bin Kim, Jonghee Lee, Jae-Hyun Lee

Applied Chemistry for Engineering :: Vol.34 No.4 pp.383-387

DOI:https://doi.org/10.14478/ace.2023.1044
Open abstract
Improved Coating of PEDOT : PSS onto CVD Graphene by the Addition of PVA

Min Ui Park, Chaeyeon Shin, Hyeji Kim, Seung Yeon Kim, Young Ju Choi, Dae-won Chung

Applied Chemistry for Engineering :: Vol.29 No.6 pp.734-739

DOI:https://doi.org/10.14478/ace.2018.1082
Open abstract
Study on the Simple Preparation Method of Honeycomb-structured Catalysts by Temperature-regulated Chemical Vapor Deposition

Minhye Seo, Soong Yeon Kim, Young Dok Kim, Sunghyun Uhm

Applied Chemistry for Engineering :: Vol.29 No.1 pp.18-21

DOI:https://doi.org/10.14478/ace.2017.1100
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Research Papers : XPS Analysis of Acrylic Acid Films Polymerized by Remote Plasma-Enhanced Chemical Vapor Deposition

Seong Hoon Kim

Applied Chemistry for Engineering :: Vol.20 No.5 pp.536-541

DOI:
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Research Papers : The Characteristics of Titanium Oxide Films Deposited by the Nozzle-type HCP RT-MOCVD

Il Hyun Jung

Applied Chemistry for Engineering :: Vol.17 No.2 pp.194-200

DOI:
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Research Papers : The Effects of Oxygen Addition in the Hot Filament-Assisted Diamond CVD 1: Morphology and Preferred Orientation

Kyu Seo Moon

Applied Chemistry for Engineering :: Vol.14 No.1 pp.69-75

DOI:
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Carbon Nanofiber / Nanotube by Catalytic Chemical Vapor Deposition

Myung Soo Kim

Applied Chemistry for Engineering :: Vol.11 No.5 pp.479-488

DOI:
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RESEARCH PAPERS : Thermal CVD of Silica Thin Film by Organic Silane Compound

Byung Hoon Kim

Applied Chemistry for Engineering :: Vol.10 No.7 pp.985-989

DOI:
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Research Papers : Li2O and Li2CO3 Thin Film Growth by LPMOCVD

Sang Chul Jung

Applied Chemistry for Engineering :: Vol.10 No.2 pp.225-230

DOI:
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