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Investigating the Effect of Photoinitiator Types and Contents on the Photocuring Behavior of Photocurable Inks and Their Applications for Etching Resist Inks

Bo-Young Kim, Subin Jo, Gwajeong Jeong, Seong Dae Park, Jihoon Kim, Eui-Keun Choi, Myong Jae Yoo, Hyunseung Yang

Applied Chemistry for Engineering :: Vol.34 No.4 pp.444-449

DOI:https://doi.org/10.14478/ace.2023.1050
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